Reticle/master pattern
Pattern a DUV reticle from transparent glass and an opaque layer using a separately available writer; actual design data are a black-box input condition Discovery hypothesis; target capability is unverified.
Discovered · unresearchedClosure: OpenInventory incomplete
Capability requirements and tolerances
Consumer-specific numerical targets, quantities and acceptance limits remain open or incompletely reviewed. No smartphone-grade suitability is claimed. Distinct capability tiers require their own making route and qualification.
Making steps · draft selected for navigation; not a validated fabrication specification.
Known Parts and Tools
The selected route supplies this page's inventory and the map's dependency links from one record. Further requirements may be missing; review flags do not prove physical suitability.
| Requirement | Role | Use | Relationship status |
|---|---|---|---|
| Glass stock | Part | incorporated or consumed; allocation not yet specified | Cycle-checked; compatibility unknown |
| Interconnect deposition stock | Part | incorporated or consumed; allocation not yet specified | Cycle-checked; compatibility unknown |
| Photoresist | Part | incorporated or consumed; allocation not yet specified | Cycle-checked; compatibility unknown |
| Mask making equipment | Tool | reused equipment | Cycle-checked; compatibility unknown |
| Etching equipment | Tool | reused equipment | Cycle-checked; compatibility unknown |
| Cleaning equipment | Tool | reused equipment | Cycle-checked; compatibility unknown |
| Optical instruments | Tool | reused equipment | Cycle-checked; compatibility unknown |
| Cleanroom | Tool | reused equipment | Cycle-checked; compatibility unknown |
| Photoresist developer | Part | incorporated or consumed; allocation not yet specified | Cycle-checked; compatibility unknown |
Making outline
- Pattern a DUV reticle from transparent glass and an opaque layer using a separately available writer; actual design data are a black-box input condition
- Develop a bounded process specification and establish earlier availability of every listed physical prerequisite.
- Make trial pieces, measure interfaces and performance with independently established references, and reject incompatible outputs.
What remains unresolved
- Identified requirement; no researched making route or qualified output yet.
- Discovery hypothesis only: quantitative demands, full recipe, quantities, losses, compatibility and acceptance remain to be researched.
Earlier research provenance
- proposals/2026-10-08-discovery/electronics/report.md
Used by
Items that directly require this item in their selected inventory.
- Chip resistors
- Color-filtered image wafer
- Fingerprint electrode array
- Microlens-finished image wafer
- Patterned analog wafer
- Patterned DRAM wafer
- Patterned gallium arsenide wafer
- Patterned Hall sensor wafer
- Patterned image sensor wafer
- Patterned inertial sensor wafer
- Patterned logic wafer
- Patterned microphone wafer
- Patterned NAND wafer
- Patterned radio CMOS wafer
- Patterned SAW wafer
- Patterned secure element wafer
- Sensor cap wafer
- Sensor feedthrough wafer
- Sensor routing wafer
- Sensor sacrificial stack wafer
Paths from Smartphone
These routes together include every item that can lead from Smartphone to this item. Repeated path combinations are collapsed; recipes are omitted.
Shortest route: Smartphone → Main board → Board passives → Chip resistors → Reticle/master pattern
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